Details

Medium size chamber variable pressure SEM with Quad Bias gun electronics which improves low voltage performance and increases beam the current. Dual high-take-off ports accommodate two EDS detectors mounted 180 degrees apart to tice the analytical data collection plus eliminate X-ray map shadows associated with rough sample surfaces. A high speed, clean, efficient TMP eliminates the need for water cooling. Advantages of being compact, high performance and user friendly. For quick observation of non-conductive samples the SU1510 utilizes variable pressure mode that eliminates negative charging, and provides the optimum conditions for both imaging and Energy Dispersive X-ray microanalysis. The specimen chamber and stage have been designed to accommodate samples as large as 153 mm in diameter. Simultaneous EDX microanalysis and imaging can be completed on a sample that is up to 60mm in height at the analytical working distance of 15 mm.

Model and Make

Scanning Electron Microscope SU1510, Hitachi

Specifications

  • Resolution SE & BSE: 3.0 nm at 30 kV (High Vacuum Mode),4.0 nm at 30 kV (Variable Pressure Mode)
  • Magnification: x5 to x300,000
  • Accelerating Voltage: 0.3 to 30 kV
  • Electron Gun: Electron Gun
  • Detectors: Secondary Electron Detector, High Sensitivity Semiconductor BSE Detector
  • Image Data Saving: 640 x 480 pixels, 1,280 x 960 pixels, 2,560 x 1,920 pixels, 5,120 x 3,840 pixels