Centre for Solar Energy Materials (CSEM)
Centrifuge Machine
- Make: Eppendorf (5804 R)
- Speed range: 200-14000 rpm
- Cooling: Refrigerated (-9 °C to 40 °C)
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Centre for Solar Energy Materials
Centrifuge machine
Chemical Bath Deposition (CBD) system
Semi automated experimental chemical bath deposition system set-up for the coating of the CdS or alternative buffer-layers on glass or flexible substrates of the size of 300 mm x 300 mm. Inside of the process chamber the substrate is being fixed between the process cover and the heating element. Automatic filling of hot (max. 90 °C) or ambient chemical into the process chamber, via the chemical dosage system by operating-panel. The process-time can be adjusted by timer and automatic wobbling by electric motor.
The equipment is being used for the deposition of CdS buffer layer by chemical bath deposition. As the buffer layer needs to be with p-type semiconductivity and high transmission properties, the equipment enables to make quality CdS buffer layer of about 50-70 nm from salt precursors within few minutes of reaction time.
Make
Singulus-Stangle, Germany
Specifications
Semiautomatic CBD system
Application
CdS or alternate buffer layer by chemical route
Chemical Bath Deposition (CBD) system
Digital Laboratory Hot Air Oven
Model & Make
UFE 700, Nabertherm GmbH, Germany
Specifications
- Memmert (UF160)
- Temperature range: 30-300 °C
- Dimensions: 560(w)*720(h)*400(d) mm
- Option: programmable temperature and duration
Details
Digital laboratory hot air oven is used for drying or curing of all sort of functional coatings / materials in a laboratory scale.
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Centre for Solar Energy Materials
Hot air oven
Dip Coater
Model & Make
H0-TH-01C, HO-TH-12T; Holmarc opto mechatronics Pvt. Ltd.
Specifications
- Stroke length/working length: 1200 mm
- Dipping speed: 30-600 mm/minute
- Withdrawal speed: 30-600 mm/minute
Details
It is used for carrying out coating process with multiple samples with wide range size of cylindrical or rectangular sample (from lab scale to prototype size). It is widely applied in solar PV, Solar thermal and Optics for the development of different functional coatings.
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Centre for Solar Energy Materials
Dip coater
Electrochemical Analyzer (Processing and Characterization)
Model & Make
PARSTAT 4000 A, AMETEK
Specifications:
- Maximum current output: ± 4A
- Maximum voltage output: ± 10V
- Frequency range: 10 µHz to 10 MHz
- Voltage sweep rate: 1mV/s to 25 kV/s
Details:
The electrochemical analyzer with a wide current and potential window is used for electrochemical processing and characterization of samples and devices by various modes such as:
- Voltammetry – Linear scan voltammetry, cyclic voltammetry, staircase voltammetry, chronoamperometry, differential pulse voltammetry, etc.
- Corrosion – Linear polarization resistance (LPR), Potentiodynamic and potentiostatic, Galanodynamic and Galvanostatic corrosion, Tafel plot, etc.
- Impedance – Pontentiostatic and Galvanostatic EIS, Mott-Schottky analysis, etc.
- Energy – Charge-discharge analysis, Cycle stability, etc.
Centre:
Centre for Solar Energy Materials
Evaporator-RTP
Evaporator-RTP is software-controlled tunnel-type furnace designed for sulfurization/selenization of CIS and CIGS on 300 mm x 300 mm glass and flexible substrate. The equipment consists of an atmospheric pressure hot-wall deposition tool for sulfur (S) and selenium (Se) diffusion coupled to an inline RTP furnace for crystallizing the complete CIGS absorber layer. The RTP module is located upstream of the evaporation module and being used for both accurately heating and cooling the active CIS/CIGS layer. As sulfurization/selenization is crucial step after deposition of Cu/CuGa and In and determines the quality CIS/CIGS thin film, deposition and RTP parameters can be varied in order to get high quality and uniform CIGS thin film with desired thickness.
Make
QuliflowTherm, France
Evaporator specifications
Maximum temperature 700oC with temperature stability +/- 2oC
RTP specifications
Temperature control range 100oC - 800oC (10oC/s heating rate) with temperature uniformity better than +/- 3%
Application
Selenization/sulfurization
Evaporator-RTP
Forced Hot Air Oven
Model & Make
UFE 700, Nabertherm GmbH, Germany
Specifications
- Make: Memmert (UFE 700)
- Temperature Range: 30 to 300 °C
- Interior dimensions: 1040 mm (w)x 800 mm (h)x 500 mm (d)
Details
Forced air circulation oven is used for drying or curing of all sort of functional coatings / materials in a large scale
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Centre for Solar Energy Materials
Hot Air Oven
Four Probe Measurement System
Model & Make
Loresta GP; Mitsubishi Chemical Analytech Co.,Ltd, Japan
Specifications
- Measurement range = 10-6 to 107 with 4-digital accuracy
- Measurement accuracy = ± 0.5% (±3digits)
- Measurement sample size = Min diameter: 5mm and Max diameter: 300mm
- Sample Type: nano to micron size films and bulk materials ( smooth or rough)
Details
The 4-pin probe method ensures precision sheet resistance and conductivity measurements from nano to micron level thin films and bulk resistivity of materials. It is widely applied in solar PV, Electronics, solar thermal and conductive materials (paint, paste, plastics, rubber, films, fiber, ceramics, etc) employed in various fields
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Centre for Solar Energy Materials
Figure 6. Four Probe
FTIR Spectrophotometer
Model & Make
Vertex 70; Bruker Optik GmbH, Germany
Specifications
- Measurement range: 400-4000 cm-1 (2.5 -25 µm)
- Spectral resolution = 0.4 cm-1
- Sample size for solid: minimum 50 to 100 mm maximum (Square)
- Sample size for thermal emissivity: 13 mm OD and 1 to 5 mm thickness
- Sample Type: Solids (bulk material and powder), liquids and thin films
Details
The equipment enables optical and thermal emittance characteristics (Transmittance, spectral emittance and thermal emissivity) of solar absorber materials and coatings especially employed in the field of solar thermal applications. Also, it enables all the basic characterisations of chemical compounds in the form of solids, liquids and low temperature crystalline in the IR region. It is widely applied in solar thermal, Solar PV and chemical analysis.
Accessories
- Integrating sphere (To determine the spectral emittance of opaque thin films)
- High pressure cell with Blackbody attached to temperature controllers (To determine the radiative emission of thin films at temperatures from 100 °C to 800 °C)
- Transmittance mode (To determine the functional groups in a thin film or pellet)
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Centre for Solar Energy Materials
Figure 2. FT-IR spectrophotometer attached with high pressure cell & Blackbody
Glass washing machine
As 300 mm x 300 mm glass is used as substrate for CIGS thin film solar cells, the quality of glass with clean surface is important and determines the functionality of solar cells. The glass washing machine is being used to degrease the glass surface to improve the chemical inertness to be used further for coating. Glass washing machine is tooled with flexible cycle programs give the user control in selecting the right combination of parameters including washing time and temperature, steam generation, number of total and pure water rinses, final rinse temperature drying time and temperature.
Make
Miele, Grmany
Application
Glass substrate cleaning
Glass washing machine
Handheld Reflectometer and Emissometer
Model & Make
410- Solar Visible, ET 100; Surface Optics Corporation
Specifications
- Measurement option: Total reflectance in the UV-VIS-IR spectral range and calculates solar absorptance (AM1.0/1.5) and thermal emissivity.
- Application: Lab and field studies
Details
The 410-Solar is a battery-operated portable reflectometer, the ideal tool for measuring the solar reflectance, solar absorptance measurements and mirror assessment. Based on a modified integrating sphere, it measures total reflectance at seven sub-bands in the 300-2500nm spectral regions. The ET-100 measures directional reflectance at six bands in the thermal infrared spectral region. Based on those values, directional and total hemispherical emissivity is calculated. The ET-100 is a handy tool for radiative heat measurement applications including field inspections.
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Centre for Solar Energy Materials
Figure 3. Handheld reflectometer and Emissometer
Helium Leak Detector
Make
Oerlicon Laybold Vacuum, Germany
Model
PhoeniXL300
Specifications
- Detectable He leak rate (vacuum mode): ≤ 5 x 10-12 mbar.l.s-1
- Detectable He leak rate (Sniffer mode): < 1 x 10-7 mbar.l.s-1
Application
- He leak detection
Details
Helium leak detector used for leak detection in vacuum system and gas lines.
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Centre for Solar Energy Materials
He leak detector
High Temperature Autoclave
Model & Make
4848 Reactor Controller, 4760-1803 reactor vessel; Parr Instrument
Specifications
- Dimensions: 600 ml reactor volume
- Vessel material: Hastelloy C-276
- Maximum pressure: 3000 psi
- Maximum temperature: 350°C
- Valves: Pressure safety valve, Gas release valve, sampling valve
Details
High-temperature autoclave can be used for preparation of functional nano-materials through Solvo and hydrothermal process by varying parameters like temperature, pressure and process duration. Pressure attained inside the reactor vessel can be monitored throughout the process duration.
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High temperature autoclave
High temperature hinged tube furnace
Model & Make
RS 120/1300/11; Nabertherm GmbH, Germany
Specifications
- Temperature maximum: 1100 °C
- Maximum possible tube outside diameter: 120 mm
- Heated tube length: 1300 mm
- Purging gas options: Hydrogen/Nitrogen/Forming gas/Air/Vacuum
Details
The high temperature hinged tube furnace allows operation under vacuum, N2, H2 and forming gas atmospheres. High quality insulating material consisting of fibre tiles enable energy saving operation and a short heating time and it can attain the temperature of 1100 °c.
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Centre for Solar Energy Materials
High temperature oven
High Temperature Vacuum Oven
Model & Make
VT 6130P; Thermo Fisher Scientific , Germany
Specifications
- Temperature range = 30 to 4000C
- Accuracy = ± 20C
- Internal Dimensions (w x h x d) : 495 x - x 592 mm
- Max. Vacuum level : 1 x 10-2 mbar (hPa)
Details
High temperature Vacuum Oven is used for drying or curing of all sort of functional coatings / materials under vacuum. It is widely applied in solar PV, Solar thermal and other applications for nanostructure material and coating developments.
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Centre for Solar Energy Materials
High temperature vacuum oven
Induction heating system
Model & Make
DC1040 Microtech Inductions Pvt. LTD
Specifications
- Power rating: 25KW
- Frequency: 10to 30 KHz
- Max. Coil current: 1000 to 2000 Amperes
- Temperature range: 300 to 1000 °C
- Sample length: 100 to 1000 mm height and 20 to 100 mm OD
Salient features
- Advanced Control Circuit for enhanced Performance
- Quick heating with sample rotation facility
- Control speed moment of inductive coil to heat the sample in uniform manner
- Compact size
Details
Induction heating is the best method of providing fast, focused and consistent heat for a wide variety of manufacturing processes, which involve bonding or changing the properties of metals or other electrically-conductive materials. Induction heating allows you to rapidly heat the object of your application while limiting contamination. The process relies on flow of electricity to produce heat and the process with the aid of modern-day technology become remarkably simple, cost effective heating method for applications which involves joining, treating and melting of materials.
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Induction heating system
Ink jet Printer
The ink jet printer is being used for printing CIGS ink and various other conductive and semi-conductive materials ink on substrates of size of 300 mm x 300 mm. Multi-material, multi layers Ink Jet Deposition Printer with precision XYZ stage control with minimum Two ( 2) Embedded Print heads having all functions required in an Ink Jet Printer like CAD/CAM Software, Automated Head Switching, Jetting analysis, realignment of substrate, print head heating, auto cleaning and wiping of print head, vacuum clamping to ensure high precision repeatability.
Make
Ceradrop, France
Specifications
2 print heads
Application
Printing CIGS ink for thin film solar cells
Ink jet printer
Intense Pulsed light System
Model & Make
Star Light, India
Specifications
- Power: 9W, pulse width: 1-30 ms, delay: 1-30 ms
Application
- Sintering and treatment of printed raw films
Details
The Intense Pulsed Light (IPL) system is composed of xenon flash lamp, an aluminum reflector, a power supply, capacitors, a simmer triggering pulse controller and a light filter. Intense Pulsed Light system is generated using arc plasma phenomenon in the xenon flash lamp. The IPL system is being used for treatment of ink printed CIGS thin films.
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Centre for Solar Energy Materials
Intense pulsed light
Laboratory Muffle Furnace
Model & Make
L5/12/P330; Nabertherm GmbH, Germany
Specifications
- Make: Nabertherm GmbH, Germany (L5/12/P330)
- Max. Operating temperature range: 1200 °C
- Inner dimensions: 200 x170x130 mm (WxDxH)
Details
It is used for drying or curing all sort of materials in a laboratory scale
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Centre for Solar Energy Materials
Laboratory muffle furnace
Laminator
The Laminator is being used for the lamination of CIGS thin film solar cell on glass or flexible substrates. The laminator is equipped with electrical heating and vacuum system. The heating system that can reach up to 180 °C with heat up and cool down rate of 5 °C/min. The upper and base area of a heating plate is suitable for effective working area of minimum 300 mm x 300 mm with temperature distribution on heating plate area during heat up and within steady state is +/- 2%.
CIGS thin film solar cell on glass substrate can be laminated using standard cure or fast cure ethyl vinyl alcohol (EVA) as encapsulant and tempered glass on top to protect from the extreme environmental sensitivity.
Make
P.Energy S.p.A., Italy
Application
Solar cell lamination of up to 600 mm x 600 mm
Laminator
Metallography Abrasive Cutting Machine
- Make: Chennai Metco Pvt Ltd (Baincut 6841 – UM)
- RPM controllable motor speed and cutting with coolant
- Sample size from 20 to 500mm length
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Centre for Solar Energy Materials
Metallography Abrasive Cutting Machine
Muffle Furnace
Model & Make
N 1000/60HA; Nabertherm GmbH, Germany
Specifications
- Maximum working temperature: 200 to 600 °C
- Furnace inner dimensions: 1000 mm (W)x 1000 mm (d)x 1000 mm (h)
- Circulation rate: 3600 m3/h
- Air circulated heating/cooling
Details
Muffle furnace features five side heating zone for the uniform thermal treatment of large area solar selective absorber tubes. PLC controller with over-temperature protection system enables long sintering cycle. Provisions are available for feeding reactive and inert gases.
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Centre for Solar Energy Materials
Muffle furnace
Multi port glove box integrated with thermal evaporator
Model & Make
MBRAUN-Germany, MB-200 glove box work station
Specifications
- Siemens PLC with multi-color touch screen
- Inficon controller for rate control/monitoring
- Recipe management
- Integrated quartz lamp heaters
Details
Thermal evaporator integrated glove box unit is used for the fabrication of perovskite solar cells inside an argon filled atmosphere. The glove box unit equipped with organic, inorganic thermal evaporators to deposit the perovskite precursor materials and metals with precise control over the thickness and uniformity of the active layers on large area. And also it contains UV-curing oven for glass to glass encapsulation of the fabricated perovskite devices.
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Centre for Solar Energy Materials
Pulse Power Supply
Model & Make
DPR series (DuPR 10-3-6); Dynatronix INC, USA
Specifications
- Real Time Cycle Control
- Ampere Time Cycle Control
- Ampere Time Totalizer
- Error signals for over-temperature, locked fan rotor, output out-of-tolerance and power failure/brownout conditions
- Calibration capability through the control interface
- Straight DC or High Frequency Pulse Output (0-5000 Hz) Capability
- 0 - 10.0 volts average (DC) or peak (pulsed) voltage
- 0 - 3.0 amps average current (or maximum DC current)
- 0.3 - 6.0 amps peak (pulsed) current
Details
Fully-programmable power supply for DC, Pulse and Pulse Reverse electrodeposition and Electrochemical anodization
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Centre for Solar Energy Materials
Quantum efficiency tester (IPCE)
Model & Make
Bentham PVE300
Specifications
- Range of operation : 300-1200/2500 nm
- Light source : 75 W Xenon and 100 W Quartz halogen
- Source irradiance : 0 – 1.5 suns
- Wavelength accuracy : ± 0.2 - 0.4 nm
- Probe size : 0.2 – 7 mm diameter
- Reference calibrators : Si 300 – 1100 nm,Ge 800 – 1800 nm
- Sample area : 200 x 200 mm
Details
- Quantifies the wavelength dependence of the cell’s photocurrent generation
- Determines the Spectral Responsivity (SR) of a solar cell
- Predicts the short circuit current, Isc, of the device under any incident spectral irradiance
- Calculates quantum efficiency, which indicates the cell’s conversion efficiency as a function of wavelength
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Centre for Solar Energy Materials
RF magnetron sputtering system
Make
Advance Process Technologies Pvt. Ltd., Pune, India
Specifications
- Sputtering targets: ZnO and AZO
- Power supply: RF power supply up to 600W
- Substrate holder: Rotatable with in-built heater for substrate heating
- Substrate size: 50x50 mm max
- Gas inputs: Ar and O2 with mass flow controllers
- Pumping system: Turbo molecular pump backed by scroll pump
Application
ZnO and AZO layer sputtering for CIGS solar cells.
Details
The RF sputtering system with a top down deposition configuration is for making transparent front contact layers on CIGS solar cells. It has 2 magnetrons having ceramic targets of ZnO and Al-doped ZnO (AZO), enabling sequential deposition of the two layers without breaking the vacuum. The system can accommodate samples of up to 50x50 mm size and has a rotatable substrate holder for improved coating thickness uniformity. Critical deposition parameters like deposition power, chamber pressure, gas flow, and target to substrate distance can be controlled through a PC with the help of a dedicated software.
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Salt spray chamber
Model & Make
Ascott, S120iP
Specifications
- Cabinet Capacity: 120Litres
- Chamber temperature range: Adjustable from ambient to +50 °C
- Temperature (Drying mode): Adjustable from ambient to +50 °C
- Temperature (Wetting mode): Adjustable from ambient to +50 °C
- Salt fog Fallout rates: Adjustable from 0.5 to 2.5ml per 80cm per hour
- Humidity range: Fixed at 95% to 100%RH
- Internal dimensions: 715mm (W)x490 mm(D)x490mm (H)
Special features
- SO2 gas dosing facility for accelerated industrial/acid environment
- Two-step programming for modified test standards
- Compatible with ASTM and ISO standards
Details
The salt spray (or salt fog) chamber is a standardized and popular corrosion test equipment, used to check corrosion resistance of materials and surface coatings. Usually, the materials to be tested are metallic and finished with a surface coating which is intended to provide a degree of corrosion protection to the underlying metal.
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Figure 5. Salt spray chamber with SO2 purging facility
Scribing system
The scribing system is for structuring thin films of conductive and semi-conductive materials on substrates with a size of 300 mm x 300 mm to produce solar cells of defined width. The scribing system provides highest flexibility. It is equipped with 1064 nm laser source, optical configurations as well as a mechanical scribing head. The special design allows to process substrates through the glass or from the film side with auto focusing option. Extraction nozzles on both sides of the substrate to remove the scribing products reliably. Particles are removed from the exhaust in a filtration unit. The scribing system works with axis speeds of up to 2 m/s on substrates with a thickness of up to 6 mm. An integrated optical recognition system allows to determine the coordinates of the P1 pattern for P2/P3 scribing as well as to perform an optical inspection of the scribing quality.
The scribing system is being used for the pattering CIGS thin film solar cells at various stages (P1, P2 and P3) and for edge deletion to make monolithically integrated CIGS thin film solar cells with minimum dead zone and large effective area.
Make
LPKF SolarQuipment, Germany
Specifications
Laser and mechanical scriber
Application
Patterning of thin film solar cells
Scribing system
Sputter Coater
Make
Singulus Technologies AG, Germany
Specifications
- In line vertical high vacuum sputter coater using pulsed DC rotary tube magnetrons
Application
- Sputter process for oxides (ZnO and Al:ZnO) and sputter process for metals (Mo, Cu, CuGa and In)
Details
The in line vertical high vacuum based sputter coater is for sputtering on the glass and flexible substrate of size of 300 mm x 300 mm. The sputter coater is being used for the deposition of various materials for CIS and CIGS thin film solar cell application such as Mo, Cu/CuGa, In, ZnO and Al:ZnO using pulsed DC rotary tube magnetrons. The sputter coater is capable to heat the substrate up to 300 °C with high temperature uniformity for hot sputter process. The sputter coater contains loading station, preheating station for preheating of the substrate and carrier to reduce the required temperature ramp rate in the vacuum and reduce the pumping time, two load lock chambers, two extension chambers, and deposition chambers for Metal and for oxides.
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Sputter coater
Stylus profilometer
Model & Make
DektakXT, Bruker
Specifications
- Measurement Technique: Stylus profilometry (contact measurement)
- Measurement Capability: Two-dimensional surface profile measurements; three-dimensional measurement/analysis
- Stylus Force: 1 to 15 mg with LIS 3
- Stylus Options: Stylus radius options (50 nm and 2 μm)
- Scan Length Range: minimum 1 to Maximum 200 mm
- Max. Sample Thickness: 50 mm
Details
Stylus profilometer used for measuring thin film thickness, 3D-Mapping, stress, and surface roughness for different applications.
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Centre for Solar Energy Materials
Figure 4. Stylus Profilometer
Tensiometer and contact angle measurement system
Contact angle meter:
- Contact angle measurement (0°-180°; ± 0.01° resolution) with of sliding angle facility
- Density of Liquid (range for densities: 0.50-2.50 g/cm3; ± 0.002 g/cm3 resolution
- sedimentation and penetration rate
Automatic surface tensiometer:
- Measurement method: Wilhelmy Plate method and du Nouy Ring method
- Measurement range 0 - 100 mN/m
- Resolution 0.01 mN/m
- Stage speed, Stroke: 0.1 - 1.0 mm/s, Stroke 48mm
- Software Standard: Surface/interfacial tension, Lamella length, Liquid density
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Ultrasonic Processor
- Make: Sonics & Materials, INC (VC505)
- Power and frequency: 500watts and 20kHz
- Tip length and diameter: 136 mm and 13mm
- Wide range of volume from 100 to 1000ml
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Centre for Solar Energy Materials
Ultrasonic processor
Ultrasonicater
- Trans-o-sonic (U-5000-H-DUN, 3015)
- Dimensions: Tank clear size 500*525*1000 mm (L*B*H)
- Ultrasonicater Power: 5000 watts
- Temperature: up to 80° C
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Centre for Solar Energy Materials
Ultrasonicater
UV-Vis-NIR Spectrophotometer
Model & Make
Cary 5000, Varian Inc., US
Specifications
- The wavelength range: 190-3300 nm
- Maximum scan rate: 2000 (UV-Vis) and 8000 (NIR)
- Possible measurements: Transmittance, reflectance (specular, diffuse and total) and absorptance of solids, films, powers and liquids.
- Accessories: Specular and DRS (integrating sphere), Transmittance mode for liquid and solid samples
- Sample size: Min diameter: 12mm and Max diameter: 100mm
Special Accessory
- Universal measurement accessory (UMA)
Specifications:
- Measurement modes: Absolute specular reflection at variable angle from 5–85° in 0.02° intervals, Direct transmission and variable angle transmission from 0–90° in 0.02° intervals, Diffuse scattering, reflection or transmission through independent sample rotation (360°) and detector positioning between 10–350° at 0.02° in intervals.
- Wavelength range: 190–2800 nm
- Auto polarizer wavelength range: 250–2500 nm
- Sample size: Diameter: minimum 5 to 250 mm maximum
- Apertures: Incident beam: 1, 2 and 3 degrees, Detector: 1, 1.8, 2, 3, 4, 4.4, 5 and 6°
Details
The equipment enables all the optical characterisations (Transmittance, absorptance and reflectance (specular, diffuse and total)) of all sort of solar energy materials and coatings as well as all the basic characterisations of chemical compounds and the determination of their concentration. It is widely applied in solar PV, Solar thermal, optics, environment analysis and investigation of chemical and photochemical reactions.
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Figure 1. UV-Vis-NIR spectrophotometer
X-ray fluorescence spectrometer (XRF)
Model & Make
FISCHERSCOPE X-RAY XDV-SDD; Helmut Fischer, Switzerland
Application
- Characterization of thin films
Details
X-ray fluorescence spectrometer with a programmable X/Y-stage and Z-axis for automated measurements of very thin coatings and for trace analysis. With its fast, programmable X/Y-stage, it is the fitting measuring instrument for automated sample measurements by mapping on the area of 250 mm x 250 mm. Using XRF spectrometer it is possible to detect up to 24 elements in a range from aluminum (13) to uranium (92) simultaneously.
As the film thickness, uniformity and composition is very crucial at various stages of the CIGS thin film fabrication process, XRF spectrometer is being used for the analysis of thickness and uniformity of various films e.g. Mo, CuGa, In, ZnO, AZO being coated during the thin film fabrication process and for composition of CIGS and CdS.
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